Ion Beam Induced Nanoscale Ripples on Si, Tio2 and Ti Surfaces - Maria C. Fravventura - Books - LAP LAMBERT Academic Publishing - 9783659488139 - November 7, 2013
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Ion Beam Induced Nanoscale Ripples on Si, Tio2 and Ti Surfaces

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In this work the roughening effect of grazing incidence ion-bombardment on a variety of inorganic surfaces is discussed. With a combination of experimental and theoretical investigations, the dynamic formation of nanoscopic periodic surface ripples is described as function of incident angle, ion fluence and temperature. Our results show the universality of the ripple formation on semiconducting, metallic and insulating surfaces. Among numerous promising applications, this research establishes the ion-bombardment technique as a valid bottom-up method for nano-patterning to be used as a cost-efficient alternative to conventional top-down lithography in semiconductors technology.

Media Books     Paperback Book   (Book with soft cover and glued back)
Released November 7, 2013
ISBN13 9783659488139
Publishers LAP LAMBERT Academic Publishing
Pages 92
Dimensions 150 × 6 × 225 mm   ·   155 g
Language German